CUTCORTEX / APPLICATIONS

From silhouette to a clear pattern.

Digital patterns for apparel. Connect clean contours, seam allowances and fabric orientation with a clear marker layout.

Dark technical jacket with visible seamsCutCortex · Design study

Think about design and construction together

An apparel pattern turns a silhouette into manufacturable pieces. Clean curves, coordinated seam lengths and clearly placed notches form the foundation. Digital construction supports changes and comparison of revisions.

Fit remains a separate check

A contour on a screen does not confirm fit. Check the relationship between pattern, material and construction with a sample. Size ranges require appropriate grading rules; simple scaling is not a substitute.

From the piece list to the marker

Check shell fabric, lining and interfacing separately. Define which pieces are paired and which are cut on the fold. Then compare markers at the same material width using identical orientation rules.

  • Keep material groups separate
  • Check paired pieces and grain direction
  • Document a sample before production
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